| CAB-O-SIL EL-90 fumed silica is a high purity product with a nominal BET surface area of 90 m2/g. The product is designed for use in dispersion and slurry formulations used to polish silicon wafers, a process commonly known as Chemical Mechanical Planarization, CMP. CAB-O-SIL EL-90 fumed silica is characterized by: - High chemical purity
- Narrow surface area range
- Narrow particle size distribution
- High level of product consistency
Chemical Mechanical Planarization is a critical process in the semiconductor manufacturing industry. CMP facilitates smooth, clean, and planar surfaces by using carefully formulated and controlled fumed metal oxide dispersions and other chemicals in conjunction with specially designed equipment and polishing pads. Cabot Corporation was one of the first providers of abrasives for CMP. Throughout the years, Cabot fumed silica has developed a proven track record of high performance and consistency at high volume production. Continuous investment in Cabot’s fumed silica manufacturing technology allowed our products to evolve with the increasingly demanding semiconductor industry and provide reliable and consistent performance in polishing applications. Additionally, Cabot has global presence, with manufacturing and technical support in Asia, North America, and Europe.
CAB-O-SIL EL-90 Fumed Silica Product Performance: The key performance features of CAB-O-SIL EL-90 fumed silica in a model slurry formulation are shown in the figures below. For the purposes of evaluating the abrasive, a model slurry formulation was used for testing. The model formulation consisted of 12% CAB-O-SIL EL-90 fumed silica in 18 M??deionized water at pH 11 (KOH stabilized).Information provided by Cabot Corporation |
