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Elmet Technologies

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Materion Nickel-Chromium (NiCr) Sputtering Target for Large Area Coating Applications
Categories: Metal; Nonferrous Metal; Nickel Alloy

Material Notes: Materion supplies sputtering targets for large area coatings. Achieving optimal results during the deposition process requires targets capable of consistently producing uniform thin films and quality materials that meet or exceed industry standards. Our high-purity Nickel-Chromium (NiCr) sputtering targets are specifically developed to produce low defect and high performance thin films.

Applications: NiCr layers are often used in low-e or solar control layer stacks. Their purpose is to mostly act as the oxidation barrier for the silver layer, but they can also be used as the absorbing layer in specific sun protection coatings. Since NiCr layers are generally sputtered as extremely thin layers (2-5 nm), perfect thickness homogeneity is necessary. Thus, the target materials must also be of extremely high homogeneity.

Information provided by Materion.

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Physical PropertiesOriginal ValueComments
Density 8.50 g/cc
 
Mechanical PropertiesOriginal ValueComments
Modulus of Elasticity 197 GPa
 
Electrical PropertiesOriginal ValueComments
Electrical Resistivity <= 0.000112 ohm-cm
 
Thermal PropertiesOriginal ValueComments
CTE, linear 7.39 µin/in-°F
Thermal Conductivity 15.1 W/m-K
Melting Point 1400 - 1420 °C
 
Component Elements PropertiesOriginal ValueComments
Chromium, Cr 19.0 - 21.0 %
Cobalt, Co <= 0.0400 %<400 ppm
Copper, Cu <= 0.0400 %<400 ppm
Iron, Fe <= 0.0750 %<750 ppm
Manganese, Mn <= 0.0200 %<200 ppm
Molybdenum, Mo <= 0.0200 %<200 ppm
Nickel, Ni 79.0 - 81.0 %
Other <= 0.200 %<2000 ppm Sum of all detected impurities
Titanium, Ti <= 0.0200 %<200 ppm

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NBB92164 / 323522

Ensinger PEI

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