high purity Dysprosium Scandium Oxide Sputtering Targets with the highest possible density High Purity (99.99%) Dysprosium Scandium Oxide Sputtering Target and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Applications: high purity Dysprosium Scandium Oxide Sputtering Targets with the highest possible density High Purity (99.99%) Dysprosium Scandium Oxide Sputtering Target and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Molecular Formula: DyScO3 Alfa Chemistry Materials product group: Metal Manufacturer data sheet |