| High purity alumina with a minimum purity of 99.8%. Specifically developed for semiconductor processing applications. Prime Features: - High resistance to semiconductor etch chemistries
- Excellent chemical resistance to acids, bases and organics
- Small grain size, low porosity, high polishability. High volume resistivity
- Superior mechanical wear resistance
- Less than 100 ppm soda and silica impurity levels
- Maintains surface integrity in corrosive environments
Typical applications: - Semiconductor components for etch, PVD, CVD, CMP, implant and litho processes
- High power laser insulators
- Wear-resistant rotary components
- Blood seals and valves
- Piston & sleeve pump sets
- High vacuum components
Production Capabilities:- Process application suppori
- Isostatic, monostatic & uniaxial pressing
- Lapping & polishing to 2 microinch Ra
- Manual, CNC and high precision machining
- Straight right cylinder straightness to <10 microinch per inch and roundness to <20 microinches
Information provided by Morgan Advanced Materials |
